半导体桥电热性质初探INTRODUCTION OF GALVANOTHERMY CHARACTER OF SEMICONDUCTOR BRIDGE
胡剑书;焦清介;
HU Jian-shu,JIAO Qing-jie(State Key Laboratory of Explosion Science and Technology of BIT,Beijing University of Technology,Beijing 100081,China)
摘要(Abstract):
介绍了半导体桥(SCB)发火器件的工作机理。通过对恒流作用下V型半导体桥的电热特性建立数学模型,得出了SCB的夹角越小、发火电流越大则发火时间越快的关系。但是,由于夹角受到半导体桥临界能量的影响,存在一个最小值,也是V型角的最佳角度。本文同时给出了一个计算升温时间的公式。
The working mechanism of semiconductor bridge is introduced in this paper.The authors establish the mathematic model of galvanothermy character of the semiconductor bridge by inputing invariable current.The conclusion is showed that the smaller the angle of V type of the semiconductor bridge is,the greater of firing current is,and so the faster of the speed of firing time; but,because of the influence of critical energy of semiconductor bridge,the minimum angle can be proved to exist,which is also the optimal angle.At last the formula about calculating the time of temperature rising is proposed in the paper.
关键词(KeyWords):
半导体桥;电热性质;V型角;发火时间
Semiconductor bridge;Galvanothermy character;Angle of V type;Firing time
基金项目(Foundation):
作者(Authors):
胡剑书;焦清介;
HU Jian-shu,JIAO Qing-jie(State Key Laboratory of Explosion Science and Technology of BIT,Beijing University of Technology,Beijing 100081,China)
参考文献(References):
- (1)祝逢春,徐振相,刘西广,等.半导体桥火工品研究新进展[J].兵工学报,2003,24(1):106-110.
- (2)谢茂浓.半导体硅桥点火器的设计初探[J].四川大学学报(自然科学版),1997,34(6):762-766.
- (3)陈越洋.半导体点火桥温度特性的模拟[D].北京:北京理工大学电子工程系,2002.
- (4)周彬,徐振相,刘西广,等.半导体桥对粒状炸药的微对流传热数值模拟[J].南京理工大学学报,1996,20(6):493-496.
- (5)周彬.半导体桥对粒状炸药的微对流加热机理的研究[D].南京:南京理工大学化工学院,1994.
- (6)祝逢春,秦志春,陈西武,等.半导体桥的设计分析[J].爆破器材,2004,33(2):22-25.
- 胡剑书
- 焦清介
HU Jian-shu- JIAO Qing-jie(State Key Laboratory of Explosion Science and Technology of BIT
- Beijing University of Technology
- Beijing 100081
- China)
- 胡剑书
- 焦清介
HU Jian-shu- JIAO Qing-jie(State Key Laboratory of Explosion Science and Technology of BIT
- Beijing University of Technology
- Beijing 100081
- China)